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Study on Impact Resistance Properties of Key Structure with the Dynamic Photoelastic Experimental Method

G.B. YANG, B. LI, F. NI, Q.R. ZHU

Abstract


The impact resistance properties of structure play an important role in designing. The dynamic photoelasticity has been widely used to investigate impact resistance properties of structures. The dynamic parameters of structures, such as propagation of stress wave and dynamic stress concentration, are obtained through this method, which provide guidelines for structure design and optimization. In this paper, this method is applied in the research on impact resistance properties of a ship key structure. An improved digital dynamic photoelastic system is also adopted to calculate elastic wave propagation in the medium, in which the diode-pumped solid-state green laser and high-speed CCD are used as light source luminaries and recording system respectively. This method has been adopted in this project successfully, and better results have been obtained.

Keywords


Impact resistance properties, Ship key structure, Dynamic photoelastic experimental method, Stress waveText

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