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Properties of RF Sputtered ZnO Thin Films under Different Oxygen Flux

Z.S. GUO

Abstract


The microstructures, optical, and mechanical properties of zinc oxide (ZnO) thin films deposited on glass substrates by rf magnetron sputtering were studied. Microstructures were examined using atomic force microscopy (AFM) and X-ray diffraction (XRD), respectively. Optical property was measured by photoluminescence spectrum. The mechanical properties were measured by nanoindentation. The crystalline structures of ZnO thin films are well ordered with high c-axis (002) orientations and the crystallinity is strongly affected by O2 flux. Surface morphologies of ZnO thin films are smooth and grains grow and distribute uniformly. The hardness and Young’s modulus of ZnO thin films are ranged from 8.2 to 10.4 GPa and 105 to 120 GPa, respectively.

Keywords


thin film; microstructure; mechanical properties; nanoindentationText

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